The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2024

Filed:

Aug. 28, 2020
Applicant:

Tae Technologies, Inc., Foothill Ranch, CA (US);

Inventors:

Vladislav Vekselman, Lake Forest, CA (US);

Alexander Dunaevsky, Corona, CA (US);

Assignee:

TAE TECHNOLOGIES, INC., Foothill Ranch, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); G01T 3/00 (2006.01); A61N 5/10 (2006.01);
U.S. Cl.
CPC ...
G21K 5/04 (2013.01); G01T 3/00 (2013.01); A61N 5/1075 (2013.01);
Abstract

Embodiments of systems, devices, and methods relate to fast beam position monitoring for detecting beam misalignment in a beam line. In an example, a fast beam position monitor includes a plurality of electrodes extending into an interior of a component of a beam line. The fast beam position monitor is configured to detect a position of a beam passing through the component of the beam line based on beam halo current. Embodiments of systems, devices, and methods further relate to noninvasively monitoring parameters of beams advancing along a beam line. In examples, gas is puffed into a pumping chamber along a beam line. One or more beam parameters are measured from fluorescence resulting from collisions of energetic beam particulates of a beam advancing through the beam line.


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