The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Mar. 02, 2023
Tae Technologies, Inc., Foothill Ranch, CA (US);
Alexander Dunaevsky, Corona, CA (US);
Gregory Luke Snitchler, Foothill Ranch, CA (US);
Harrison Beam Eggers, Pendleton, SC (US);
Jedediah Styron, Wildomar, CA (US);
Charles Leon Lee, Irvine, CA (US);
TAE Technologies, Inc., Foothill Ranch, CA;
Abstract
Embodiments of systems, devices, and methods relate to exclusion of ion beam paths on the target surface to optimize neutron beam performance. A particle beam is directed along an axis so that the particle beam is incident on a target positioned on the particle beam axis. The target has a scannable surface extending over an area substantially orthogonal to the axis. The particle beam is scanned across the scannable surface of the target along a first path having a first flux. The particle beam, having a second flux, is scanned across the scannable surface of the target along a second path that is within an exclusion area of the target.