The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2024
Filed:
Jun. 23, 2021
Applicant:
Tae Technologies, Inc., Foothill Ranch, CA (US);
Inventors:
Vladislav Vekselman, Lake Forest, CA (US);
Alexander Dunaevsky, Corona, CA (US);
Andrey A. Korepanov, Foothill Ranch, CA (US);
Assignee:
TAE TECHNOLOGIES, INC., Foothill Ranch, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 5/06 (2006.01); H01J 27/02 (2006.01);
U.S. Cl.
CPC ...
H01J 27/028 (2013.01); H01J 27/022 (2013.01); H05H 5/063 (2013.01); H01J 2237/06375 (2013.01);
Abstract
Embodiments of systems, devices, and methods relate to an ion beam source system. An ion source is configured to provide a negative ion beam to a tandem accelerator system downstream of the ion source, and a modulator system connected to an extraction electrode of the ion source is configured to bias the extraction electrode for a duration sufficient to maintain acceleration voltage stability of the tandem accelerator system.