The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Aug. 28, 2020
Applicant:

Tae Technologies, Inc., Foothill Ranch, CA (US);

Inventors:

Alexander Dunaevsky, Corona, CA (US);

Artem N. Smirnov, Mission Viejo, CA (US);

Alexandr A. Ivanov, Novosibirsk, RU;

Vladislav Vekselman, Lake Forest, CA (US);

Assignee:

TAE TECHNOLOGIES, INC., Foothill Ranch, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/10 (2006.01); H05H 5/03 (2006.01); H05H 5/06 (2006.01);
U.S. Cl.
CPC ...
A61N 5/1077 (2013.01); A61N 5/1048 (2013.01); H05H 5/03 (2013.01); H05H 5/063 (2013.01); A61N 2005/109 (2013.01); A61N 2005/1095 (2013.01);
Abstract

Embodiments of systems, devices, and methods relating to a beam system. An example beam system includes a charged particle source configured to generate a beam of charged particles, a pre-accelerator system configured to accelerate the beam, and an accelerator configured to accelerate the beam from the pre-accelerator system. The pre-accelerator system can cause the beam to converge as it is propagated from the source to an input aperture of the accelerator. The pre-accelerator system can further reduce or eliminate source disturbance or damage caused by backflow traveling from the accelerator toward the source.


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