Albert Zhong

Title: Albert Zhong: Innovator in Integrated Chip Technology

Introduction

Albert Zhong is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of integrated chip technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and functionality of programmable metallization cells.

Latest Patents

One of Albert Zhong's latest patents involves a diffusion barrier layer in a programmable metallization cell. This invention relates to a method for forming an integrated chip. The method includes forming a bottom electrode over a substrate, followed by the creation of a data storage layer on the bottom electrode. A diffusion barrier layer is then formed over the data storage layer, which possesses a first diffusion activation temperature. Subsequently, a top electrode is formed over the diffusion barrier layer, with the top electrode having a second diffusion activation temperature that is less than the first diffusion activation temperature. This innovative approach aims to improve the performance and reliability of integrated circuits.

Career Highlights

Albert Zhong is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role at the company allows him to work on cutting-edge technologies that shape the future of electronics. His expertise in integrated chip design has positioned him as a valuable asset in the field.

Collaborations

Albert collaborates with talented individuals such as Cheng-Yuan Tsai and Hai-Dang Trinh. Their combined efforts contribute to the advancement of semiconductor technology and innovation.

Conclusion

In summary, Albert Zhong is a key figure in the realm of integrated chip technology, with a focus on programmable metallization cells. His patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his commitment to innovation in the semiconductor industry.