Company Filing History:

14 out of 10,295

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2015-2021

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14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11011369 - Carbon film forming method, carbon film forming apparatus, and storage medium (2021-05-18),

2. 10559460 - Film forming apparatus and film forming method (2020-02-11),

3. 10546741 - Selective growth method (2020-01-28),

4. 10351952 - Film formation apparatus, film formation method, and storage medium (2019-07-16),

5. 9970110 - Plasma processing apparatus (2018-05-15),

6. 9945028 - Method of filling recess (2018-04-17),

7. 9865457 - Nitride film forming method using nitrading active species (2018-01-09),

8. 9512541 - Selective growth method and substrate processing apparatus (2016-12-06),

9. 9472393 - Method and apparatus for forming silicon oxide film (2016-10-18),

10. 9466478 - Film forming method and film forming apparatus (2016-10-11),

11. 9425071 - Film forming method (2016-08-23),

12. 9425038 - Method and apparatus for forming silicon oxycarbonitride film, silicon oxycarbide film and silicon oxynitride film (2016-08-23),

13. 9390907 - Film forming method of SiCN film (2016-07-12),

14. 9165780 - Plasma processing apparatus and plasma processing method (2015-10-20),

Title: Akira Shimizu: Innovator in Carbon Film Technology

Introduction

Akira Shimizu is a prominent inventor based in Nirasaki, Japan, known for his significant contributions to carbon film technology. With a total of 14 patents to his name, Shimizu has made remarkable advancements in methods and apparatuses for forming carbon films and silicon nitride films.

Latest Patents

Shimizu's latest patents include a carbon film forming method and apparatus, as well as a storage medium. The carbon film forming method involves loading a workpiece into a process chamber and supplying a gas containing a boron-based thin film to create a seed layer on the workpiece's surface. Following this, a hydrocarbon-based carbon source gas and a pyrolysis temperature lowering gas containing a halogen element are introduced. This innovative process allows for the formation of a carbon film on the workpiece through thermal chemical vapor deposition (CVD). Additionally, his film forming apparatus is designed to create a silicon nitride film on a substrate by reacting a precursor gas containing silicon with a nitrogen-containing reaction gas.

Career Highlights

Throughout his career, Akira Shimizu has worked with notable companies such as Tokyo Electron Limited and Iwatani Corporation. His experience in these organizations has contributed to his expertise in the field of film formation technologies.

Collaborations

Shimizu has collaborated with several talented individuals, including Masayuki Kitamura and Kazuhide Hasebe, who have played important roles in his innovative projects.

Conclusion

Akira Shimizu's work in carbon film technology and his impressive portfolio of patents highlight his status as a leading inventor in the field. His contributions continue to influence advancements in material science and engineering.

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