Akira Okabe

This inventor holds 13 USPTO granted patents and 1 published patent application and 3 EPO patents. Top assignees: Epicrew Corporation, Applied Materials, Inc.. Active years: 2012-2026.

USPTO Granted Patents = 13 (Patent Applications = 1)

% Patents Active = 92.3

EPO Patents = 3 (Patent Applications = 3)

Average Co-Inventor Count = 1.8

ph-index = 3

Forward Citations = 457(Granted Patents)

Location History:

Ohnura, JP (2016)
Omura, JP (2019)
Nagasaki, JP (2021)
Ohmura, JP (2012 - 2022)

Company Filing History:

Applied Materials, Inc.

patents

Years Active: 2012-2026

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12680191 - Vapor phase growth system and method of producing epitaxial wafer (2026-07-14),

2. 12327724 - Vapor deposition device and method of producing epitaxial wafer (2025-06-10),

3. 11427928 - Lower side wall for epitaxtail growth apparatus (2022-08-30),

4. D926715 - Support for a wafer for fabricating a semiconductor (2021-08-03),

5. 10443129 - Epitaxial growth device (2019-10-15),

6. 10222779 - Semiconductor wafer position display system, semiconductor wafer position display method, and semiconductor wafer position display program (2019-03-05),

7. 10072354 - Lower side wall for epitaxial growth apparatus (2018-09-11),

8. 9663873 - Ceiling portion for epitaxial growth apparatus (2017-05-30),

9. 9250196 - Imaging device, semiconductor manufacturing apparatus, and semiconductor manufacturing method (2016-02-02),

10. 9096949 - Susceptor support portion and epitaxial growth apparatus including susceptor support portion (2015-08-04),

11. 8888087 - Susceptor support portion and epitaxial growth apparatus including susceptor support portion (2014-11-18),

12. D693782 - Lid for epitaxial growing device (2013-11-19),

13. 8199192 - Observation unit (2012-06-12),

Title: Akira Okabe: Innovator in Vapor Deposition Technology

Introduction

Akira Okabe is a prominent inventor based in Ohmura, Japan, known for his significant contributions to the field of vapor deposition technology. With a total of 12 patents to his name, Okabe has made remarkable advancements that have influenced various industries.

Latest Patents

Among his latest patents is a vapor deposition device and method for producing epitaxial wafers. This innovative vapor phase growth system features a process chamber equipped with a susceptor lifting mechanism that allows for precise control of the susceptor's position. In the first position, the susceptor's top surface is elevated above the preheating ring, creating a source gas distribution space. In the second position, the susceptor is lowered, facilitating a substrate loading and unloading space that enhances the efficiency of the process. Another notable patent involves a lower side wall for use in a processing chamber, designed to optimize gas concentration through a series of concave grooves.

Career Highlights

Throughout his career, Okabe has worked with notable companies such as Epicrew Corporation and Applied Materials, Inc. His work has been instrumental in advancing technologies that are critical to semiconductor manufacturing and other applications.

Collaborations

Okabe has collaborated with esteemed colleagues, including Yoshinobu Mori and Masanori Tanoguchi, who have contributed to his innovative projects and research endeavors.

Conclusion

Akira Okabe's contributions to vapor deposition technology and his impressive portfolio of patents underscore his role as a leading inventor in the field. His work continues to impact the industry and inspire future innovations.