The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Feb. 07, 2013
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Yoshinobu Mori, Ohmura, JP;
Akira Okabe, Ohmura, JP;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C30B 25/14 (2006.01); C23C 16/46 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/48 (2006.01); C30B 29/06 (2006.01);
U.S. Cl.
CPC ...
C23C 16/46 (2013.01); C23C 16/4585 (2013.01); C23C 16/45502 (2013.01); C23C 16/481 (2013.01); C30B 25/14 (2013.01); C30B 29/06 (2013.01);
Abstract
An epitaxial growth device comprises a reaction chamber defined by a substrate setting portion, a ceiling board and a sidewall portion, a heating member and reactant gas-introduction member. The ceiling board is fixed to a ring-like support portion having a through-hole as viewed from above. A diameter of the through-hole becomes reduced gradually toward a substrate-side. The ceiling board is fixed to an end portion of the substrate-side of the through-hole.