The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Nov. 27, 2006
Akira Okabe, Ohmura, JP;
Akira Okabe, Ohmura, JP;
Epicrew Corporation, Nagasaki, JP;
Abstract
It is an object of the present invention to provide an observation unit which efficiently cools apparatus members in a reaction chamber of a semiconductor manufacturing apparatus in a high-temperature atmosphere and reduces overexposure. An observation unit comprising: an imaging apparatus for imaging the inside of a reaction chamber of a semiconductor manufacturing apparatus in an atmosphere of a high temperature; a housing case which houses the imaging apparatus and is attached with a translucent member which guides an optical image of the inside of the reaction chamber to the imaging apparatus; and a cooling medium supplying apparatus for supplying a cooling medium to the inside of the housing case, wherein the translucent member is a silica glass plate having a gold film on both sides or one side.