Company Filing History:
Years Active: 1995-1997
Title: Akira Nozawa: Innovator in Plasma Etching Technology
Introduction
Akira Nozawa is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma etching technology, holding two patents that showcase his innovative approach to this area.
Latest Patents
Nozawa's latest patents include a plasma etching system and a plasma etching method. The plasma etching system comprises a process chamber that encloses a plasma, means for evacuating the chamber, a chuck electrode for supporting a substrate, and a shower electrode with numerous small holes. It also features a power source for applying plasma voltage between the chuck and shower electrodes, along with gas supply means that communicate with the small holes to supply a plasma-forming gas. The system is designed to control the gas supply such that the plasma-forming gas flows through the small holes at a mass flow rate of at least 620 kg/m²/hr.
Career Highlights
Throughout his career, Akira Nozawa has worked with prominent companies such as Hitachi, Ltd. and Hitachi Tokyo Electronics Co., Ltd. His experience in these organizations has contributed to his expertise in plasma technology and innovation.
Collaborations
Nozawa has collaborated with notable coworkers, including Kazushi Tomita and Yoshikazu Ito. Their combined efforts have further advanced the field of plasma etching.
Conclusion
Akira Nozawa's contributions to plasma etching technology through his patents and career experiences highlight his role as an influential inventor in this specialized field. His work continues to impact the industry significantly.
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