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For the Inventor, By the Inventor

Hino, Japan

Akira Nishiwaki

This inventor holds 10 USPTO granted patents. Top assignee: Konica Corporation. Active years: 1993-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Nishiwaki. Retrieved from https://idiyas.com/inventor/akira-nishiwaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 70.0

Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 96(Granted Patents)


Location History:

  • Tokyo, JP (1999 - 2003)
  • Hachioji, JP (2005)
  • Hino, JP (1993 - 2009)

Company Filing History:

goldMedal10 out of 3,106 
 
Konica Corporation
 patents

Years Active: 1993-2009

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10 patents (USPTO):Explore Patents
1. 7632550 - Film forming method employing reactive and reducing gases and substrate formed by the method (2009-12-15),
2. 7166335 - Layer formation method, and substrate with a layer formed by the method (2007-01-23),
3. 6849306 - Plasma treatment method at atmospheric pressure (2005-02-01),
4. 6759100 - Layer formation method, and substrate with a layer formed by the method (2004-07-06),
5. 6652069 - Method of surface treatment, device of surface treatment, and head for use in ink jet printer (2003-11-25),
6. 6248406 - Light-sensitive material and coating apparatus thereof (2001-06-19),
7. 5895687 - Method for coating a substrate using inclined edge guides (1999-04-20),
8. 5871821 - Curtain coating with dynamic surface tension control of layers (1999-02-16),
9. 5374382 - Method of generation and recovery of ultra-fine particles (1994-12-20),
10. 5186872 - Method for generation and collection of ultra fine particles without (1993-02-16),

Title: Akira Nishiwaki: Innovator in Film Forming Technologies

Introduction

Akira Nishiwaki is a prominent inventor based in Hino, Japan. He has made significant contributions to the field of film forming technologies, holding a total of 10 patents. His innovative work focuses on methods that enhance the efficiency and quality of film formation processes.

Latest Patents

Nishiwaki's latest patents include a film forming method employing reactive and reducing gases. This method involves supplying a reactive gas that contains a metal atom between facing electrodes. By applying a voltage between the electrodes, the reactive gas is transformed into a plasma state, allowing for the formation of a metal film on a substrate's surface. Another notable patent is a layer formation method, which utilizes a high-frequency electric field to excite gas at atmospheric pressure. This method ensures that a substrate is effectively exposed to the excited gas, leading to improved layer formation.

Career Highlights

Throughout his career, Nishiwaki has been associated with Konica Corporation, where he has played a vital role in advancing film forming technologies. His expertise and innovative approaches have positioned him as a key figure in the industry.

Collaborations

Nishiwaki has collaborated with several talented individuals, including Yoshikazu Kondo and Kazuhiro Fukuda. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies.

Conclusion

Akira Nishiwaki's contributions to film forming technologies are noteworthy, and his patents reflect his commitment to innovation. His work continues to influence the field, showcasing the importance of creativity and collaboration in technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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