The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Aug. 16, 2002
Kazuhiro Fukuda, Hino, JP;
Yoshikazu Kondo, Hino, JP;
Yoshiro Toda, Hino, JP;
Kiyoshi Oishi, Hino, JP;
Akira Nishiwaki, Hachioji, JP;
Wataru Mizuno, Hachioji, JP;
Koji Fukazawa, Tachikawa, JP;
Kazuhiro Fukuda, Hino, JP;
Yoshikazu Kondo, Hino, JP;
Yoshiro Toda, Hino, JP;
Kiyoshi Oishi, Hino, JP;
Akira Nishiwaki, Hachioji, JP;
Wataru Mizuno, Hachioji, JP;
Koji Fukazawa, Tachikawa, JP;
Konica Corporation, Tokyo, JP;
Abstract
A plasma treatment method for surface treatment of a substrate with an atmospheric pressure plasma treatment apparatus is disclosed. The apparatus has a first electrode and a second electrode opposed to each other, a discharge space between the opposed electrodes, a voltage application means for applying voltage across the discharge space, a gas supply means for supplying a reactive gas and an inert gas to the discharge space. The method is one wherein the reactive gas at the discharge space is excited at atmospheric pressure or at approximately atmospheric pressure by applying voltage through the voltage application means to generate discharge plasma, and a substrate is exposed to the discharge plasma to be subjected to surface treatment, and wherein the reactive gas is not directly in contact with the discharge surface of the first electrode or the second electrode.