The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Feb. 11, 2003
Wataru Mizuno, Hino, JP;
Kazuhiro Fukuda, Hino, JP;
Yoshikazu Kondo, Hino, JP;
Yoshiro Toda, Hino, JP;
Kiyoshi Oishi, Hino, JP;
Akira Nishiwaki, Hino, JP;
Wataru Mizuno, Hino, JP;
Kazuhiro Fukuda, Hino, JP;
Yoshikazu Kondo, Hino, JP;
Yoshiro Toda, Hino, JP;
Kiyoshi Oishi, Hino, JP;
Akira Nishiwaki, Hino, JP;
Konica Corporation, Tokyo, JP;
Abstract
A film forming method comprising: supplying a reactive gas comprising a compound including a metal atom between facing electrodes; arranging a substrate between the electrodes; making the reactive gas in a plasma state by applying a voltage between the electrodes under atmospheric pressure or under a pressure in a vicinity of the atmospheric pressure and discharging; and forming a metal film on a surface of the substrate by supplying a reducing gas having a reducing property into a plasma atmosphere in which the reactive gas in the plasma state exists.