The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2007
Filed:
May. 07, 2004
Kazuhiro Fukuda, Hino, JP;
Yasuo Morohoshi, Hino, JP;
Akira Nishiwaki, Hino, JP;
Yoshikazu Kondo, Hino, JP;
Yoshiro Toda, Hino, JP;
Kiyoshi Oishi, Hino, JP;
Kazuhiro Fukuda, Hino, JP;
Yasuo Morohoshi, Hino, JP;
Akira Nishiwaki, Hino, JP;
Yoshikazu Kondo, Hino, JP;
Yoshiro Toda, Hino, JP;
Kiyoshi Oishi, Hino, JP;
Konica Corporation, Tokyo, JP;
Abstract
A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a high frequency electric field across the discharge space, and exposing a substrate to the excited gas, wherein the high frequency electric field is an electric field in which a first high frequency electric field and a second high frequency electric field are superposed, frequency ωof the second high frequency electric field is higher than frequency ωof the first high frequency electric field, strength Vof the first high frequency electric field, strength Vof the second high frequency electric field and strength IV of discharge starting electric field satisfy relationship V≧IV>Vor V>IV≧V, and power density of the second high frequency electric field is not less than 1 W/cm.