Konica Corporation

Akira Nishiwaki

Yoshikazu Kondo

Kazuhiro Fukuda

Yoshiro Toda

Kiyoshi Oishi

Koji Fukazawa

Yasuo Morohoshi

Wataru Mizuno

Atsushi Saito

Yasuo Moroboshi

A film forming method comprising: supplying a reactive gas comprising a compound including a metal atom between facing electrodes; arranging a substrate between the electrodes; making the reactive gas in a plasma state by applying a voltage between the electrodes under atmospheric pressure or under a pressure in a vicinity of the atmospheric pressure and discharging; and forming a metal film on a surface of the substrate by supplying a reducing gas having a reducing property into a plasma atmosphere in which the reactive gas in the plasma state exists.

Film forming method employing reactive and reducing gases and substrate formed by the method

A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a high frequency electric field across the discharge space, and exposing a substrate to the excited gas, wherein the high frequency electric field is an electric field in which a first high frequency electric field and a second high frequency electric field are superposed, frequency &#x3c9;of the second high frequency electric field is higher than frequency &#x3c9;of the first high frequency electric field, strength Vof the first high frequency electric field, strength Vof the second high frequency electric field and strength IV of discharge starting electric field satisfy relationship V&#x2267;IV&#x3e;Vor V&#x3e;IV&#x2267;V, and power density of the second high frequency electric field is not less than 1 W/cm.

Layer formation method, and substrate with a layer formed by the method

A plasma treatment method for surface treatment of a substrate with an atmospheric pressure plasma treatment apparatus is disclosed. The apparatus has a first electrode and a second electrode opposed to each other, a discharge space between the opposed electrodes, a voltage application means for applying voltage across the discharge space, a gas supply means for supplying a reactive gas and an inert gas to the discharge space. The method is one wherein the reactive gas at the discharge space is excited at atmospheric pressure or at approximately atmospheric pressure by applying voltage through the voltage application means to generate discharge plasma, and a substrate is exposed to the discharge plasma to be subjected to surface treatment, and wherein the reactive gas is not directly in contact with the discharge surface of the first electrode or the second electrode.

Plasma treatment method at atmospheric pressure

A layer formation method is disclosed which comprises supplying gas to a discharge space, exciting the supplied gas at atmospheric pressure or at approximately atmospheric pressure by applying a high frequency electric field across the discharge space, and exposing a substrate to the excited gas, wherein the high frequency electric field is an electric field in which a first high frequency electric field and a second high frequency electric field are superposed, frequency &ohgr; of the second high frequency electric field is higher than frequency &ohgr; of the first high frequency electric field, strength V of the first high frequency electric field, strength V of the second high frequency electric field and strength IV of discharge starting electric field satisfy relationship V &gE;IV>V or V >IV&gE;V , and power density of the second high frequency electric field is not less than 1 W/cm .

In a surface treatment for treating a surface of a subject of treating by a discharge-activated gas, under an atmospheric pressure or a pressure in the neighborhood of it, by arranging a second electrode at a position separated from the discharging section for generating said discharge-activated gas by a first electrode coated with a dielectric substance, and arranging a surface to be treated of a subject of treating between said plasma generating part, serving as a discharging section, and said second electrode, a surface treatment of said subject of treating is practiced.

Method of surface treatment, device of surface treatment, and head for use in ink jet printer

A coating apparatus for coating a conveyed support with an emulsion for a photographic light-sensitive material by letting the emulsion flow down between a pair of edge guides so as to form a curtain layer of the emulsion. The apparatus includes a slide surface, having a slit and inclined for a predetermined angle to the horizontal axis, for supplying the emulsion; side plates provided on both edges of the slide surface; the pair of edge guides each provided on respective one of the edges; and plural solution injecting outlets, each provided on respective one of the side plates, for supplying auxiliary solution; in which a coating operation of the conveyed support with the emulsion is conducted while the auxiliary solution is being flowed down along the edge guides at a flow rate between 0.3 cc/min. and 3.0 cc/min. from each of the solution injecting outlets.

Light-sensitive material and coating apparatus thereof

A method for producing a light-sensitive material. The method includes the steps of: discharging coating solution, including the light-sensitive material, from a coater die; forming a curtain layer of coating solution by causing the coating solution to fall from a die lip of the coater die in which the curtain layer is formed with an edge guide in which an end of the edge guide is arranged in the vicinity of the die lip and the other end of the edge guide is inclined toward the coater die in relation to the vertical line from the die lip; and coating a support with the coating solution by conveying the support at the downstream end of the curtain layer.

Method for coating a substrate using inclined edge guides

A method for producing light-sensitive material by using a curtain layer of coating solution. The method includes the steps of: discharging coating solution, including the light-sensitive material, from a coater die; forming a curtain layer of coating solution by causing the coating solution to fall from a die lip of the coater die in which the coating solution has at least 3 layers and a relational structure of dynamic surface tensions of the layers, satisfying the equation: .DELTA.K=.sigma.intermediate.sub.min -.sigma.outer.sub.max .gtoreq.0�mN/m! in which, .sigma.intermediated.sub.min �mN/m! represents the minimum value of dynamic surface tension of an intermediate layer among the layers, .sigma.outers.sub.max �mN/m! represents the maximum value of dynamic surface tension of an outer layer among the layers; and coating a continuous support with the coating solution.

Curtain coating with dynamic surface tension control of layers

The invention provides a method of producing ultra-fine particles and an apparatus therefor. A particle carrier is moved in a chamber which is decompresed and charged with inert gas. An evaporable material is heated so as to deposit evaporated ultra-fine particles onto a part of the moving particle carrier. The deposited ultra-fine particles are collected from the part of the moving particle carrier while evaporated ultra-fine particles deposit onto another part of the moving particle carrier.

Method of generation and recovery of ultra-fine particles

A method of producing fine particles of a material by evaporating the material into an inert gas. The material is evaporated in a evaporation vessel and the fine particles are generated by cooling the evaporated material with the inert gas blown into the evaporated material from the evaporation vessel. The flow of the fine particles is restricted within a path from the evaporation vessel toward a deposit holding body by means of a scatter preventing wall around the path. The fine particles are deposited on the surface of the evaporation vessel and then receovered.

Growing community of inventors

Hino, Japan

Akira Nishiwaki