This inventor holds 3 USPTO granted patents and 2 EPO patents. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2016-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016-2017
Title: Akira Ikeda: Innovator in Photomask Technology
Introduction
Akira Ikeda is a prominent inventor based in Jyoetsu, Japan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on the development of advanced materials and methods for manufacturing photomask blanks, which are essential in the semiconductor manufacturing process.
Latest Patents
Ikeda's latest patents include innovative methods for producing photomask blanks. One of his notable inventions is a method for manufacturing a photomask blank that features a silicon-containing inorganic film over a transparent substrate. This method ensures that the surface of the film has an oxygen concentration between 55 and 75 atomic percent. The silicon-containing inorganic film serves as a hard mask film, enhancing the quality and reliability of photomasks. Another significant patent involves a photomask blank obtained by forming a resist film after a silylation process on a silicon-containing inorganic film. This method effectively inhibits the generation of defects due to resist residues after development, showcasing Ikeda's commitment to improving manufacturing processes.
Career Highlights
Ikeda is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to innovate in the field of photomask technology. His expertise and dedication have positioned him as a key figure in the industry, contributing to advancements that support the semiconductor sector.
Collaborations
Throughout his career, Ikeda has collaborated with notable colleagues, including Takashi Yoshii and Yoshio Kawai. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Akira Ikeda's contributions to photomask technology through his patents and work at Shin-Etsu Chemical Co., Ltd. highlight his role as a leading inventor in the field. His innovative methods continue to influence the semiconductor manufacturing process, ensuring high-quality production standards.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile