Location History:
- Mie, JP (2004 - 2009)
- Tokyo, JP (2003 - 2016)
Company Filing History:
Years Active: 2003-2016
Title: Akimasa Soyano: Innovator in Radiation-Sensitive Resin Technology
Introduction
Akimasa Soyano is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, with a total of 6 patents to his name. His work focuses on enhancing the performance of resist coating films used in lithography processes.
Latest Patents
Soyano's latest patents include innovative developments in radiation-sensitive resin compositions. One notable patent describes a radiation-sensitive resin composition that provides a resist coating film suitable for liquid immersion lithography. This composition is designed to exhibit a great dynamic contact angle during exposure, which enhances the water draining properties of the resist coating film. Additionally, it allows for a significant decrease in the dynamic contact angle during development, thereby inhibiting the generation of development defects and shortening the time required for changes in dynamic contact angle. Another patent details a radiation-sensitive resin composition that includes a polymer and a photoacid generator, with specific structural units that optimize its performance.
Career Highlights
Soyano is currently employed at JSR Corporation, where he continues to advance his research in radiation-sensitive materials. His work has been instrumental in improving the efficiency and effectiveness of lithography processes, which are critical in semiconductor manufacturing.
Collaborations
Throughout his career, Soyano has collaborated with notable colleagues, including Yukio Nishimura and Noboru Otsuka. These collaborations have further enriched his research and contributed to the development of innovative technologies in the field.
Conclusion
Akimasa Soyano's contributions to radiation-sensitive resin technology have positioned him as a key figure in the industry. His innovative patents and ongoing research continue to influence advancements in lithography processes, showcasing his dedication to the field.