The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2009
Filed:
Dec. 12, 2005
Didier Benoit, San Jose, CA (US);
Adam Safir, Berkeley, CA (US);
Han-ting Chang, Livermore, CA (US);
Dominique Charmot, Campbell, CA (US);
Isao Nishimura, Mie, JP;
Akimasa Soyano, Mie, JP;
Kenji Okamoto, Mie, JP;
Yong Wang, Mie, JP;
Didier Benoit, San Jose, CA (US);
Adam Safir, Berkeley, CA (US);
Han-Ting Chang, Livermore, CA (US);
Dominique Charmot, Campbell, CA (US);
Isao Nishimura, Mie, JP;
Akimasa Soyano, Mie, JP;
Kenji Okamoto, Mie, JP;
Yong Wang, Mie, JP;
JSR Corporation, Tokyo, JP;
Abstract
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.