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For the Inventor, By the Inventor

Utsunomiya, Japan

Akihiro Nakauchi

This inventor holds 14 USPTO granted patents and 2 published patent applications. Top assignee: Canon Kabushiki Kaisha. Active years: 2003-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akihiro Nakauchi. Retrieved from https://idiyas.com/inventor/akihiro-nakauchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14 

% Patents Active = 28.6

Average Co-Inventor Count = 1.2

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Tochigi, JP (2003 - 2009)
  • Utsunomiya, JP (2004 - 2017)

Company Filing History:

goldMedal14 out of 92,994 
 
Canon Kabushiki Kaisha
 patents

Years Active: 2003-2017

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14 patents (USPTO):Explore Patents
1. 9719773 - Measuring method and measuring apparatus (2017-08-01),
2. 8868366 - Calculation method and calculation apparatus (2014-10-21),
3. 8823950 - Shape measurement apparatus, and shape measurement method (2014-09-02),
4. 8345263 - Measurement method and measurement apparatus that measure a surface figure of an aspheric surface based on an interference pattern (2013-01-01),
5. 8314937 - Measurement method and measurement apparatus that measure a surface figure of an aspheric surface based on an interference pattern (2012-11-20),
6. 8004691 - Measuring apparatus, exposure apparatus and method, and device manufacturing method (2011-08-23),
7. 7619748 - Exposure apparatus mounted with measuring apparatus (2009-11-17),
8. 7602473 - Exposure apparatus and device manufacturing method using the same (2009-10-13),
9. 7403291 - Method of calculating two-dimensional wavefront aberration (2008-07-22),
10. 7081962 - Aberration measuring apparatus for an optical system utilizing soft x-rays (2006-07-25),
11. 6977728 - Projection exposure apparatus and aberration measurement method (2005-12-20),
12. 6859264 - Projection exposure apparatus having aberration measurement device (2005-02-22),
13. 6721056 - Surface shape measuring apparatus and method (2004-04-13),
14. 6650398 - Wavefront aberration measurement method and projection exposure apparatus (2003-11-18),

Title: **Innovative Contributions of Akihiro Nakauchi**

Introduction

Akihiro Nakauchi, a prominent inventor based in Utsunomiya, Japan, has made significant strides in the field of surface measurement technology. With a portfolio of 14 patents, his inventions reflect a deep understanding of measurement methodologies and their applications in various industries.

Latest Patents

Among his latest contributions are two noteworthy patents. The first, titled **Measuring Method and Measuring Apparatus**, introduces a novel approach for measuring the shape of a surface of an object. The method involves obtaining shape data for overlapping regions of the surface and calculating an error to optimize measurement precision. The second patent, **Calculation Method and Calculation Apparatus**, outlines a comprehensive method for calculating the surface shape of a target surface by removing average data from overlapping regions, thus generating precise correction data.

Career Highlights

Akihiro Nakauchi is associated with Canon Kabushiki Kaisha, where his innovative techniques have advanced the core capabilities of the company in surface measurement technologies. His contributions have positioned Canon as a leading entity in the industry, highlighting the company's commitment to innovation and research.

Collaborations

In his career, Nakauchi has collaborated with esteemed colleagues, including Ryuichi Sato and Chidane Ouchi. These partnerships foster a creative environment that encourages the exchange of ideas and drives collective advancements in technology.

Conclusion

Akihiro Nakauchi's contributions to the field of measurement technology are invaluable. His ongoing work at Canon and his robust patent portfolio underscore a commitment to innovation that continues to impact the industry significantly. Through his inventions, Nakauchi not only enhances measurement precision but also paves the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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