The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2009
Filed:
Apr. 21, 2006
Akihiro Nakauchi, Utsunomiya, JP;
Akihiro Nakauchi, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes an illumination optical system adapted to illuminate a reflection mask with light from an exposure light source, and a projection optical system adapted to project a pattern image of the reflection mask disposed in an object plane onto a substrate disposed in an image plane. The illumination optical system includes a reflection integrator adapted to form a plurality of secondary light sources with the light from the exposure light source, a condenser unit adapted to superimpose beams of light from the secondary light sources with one another on the reflection mask, and a mirror capable of being disposed in an optical path instead of the reflection integrator. When the mirror is disposed in the optical path, an illuminated area formed in the object plane of the projection optical system is reduced in comparison with that formed when the reflection integrator is disposed in the optical path.