Location History:
- Tokyo, JP (1999 - 2003)
- Hino, JP (1994 - 2022)
Company Filing History:
16 out of 4,240 
8 out of 3,106 
5 out of 713 
Years Active: 1994-2025
Title: Akihiro Maezawa: A Pioneer in Innovative Patents from Hino, Japan
Introduction
Akihiro Maezawa is a prolific inventor based in Hino, Japan, holding an impressive portfolio of 32 patents. His contributions to the field of technology, especially focusing on polishing processes and detection systems, showcase his innovative spirit and commitment to advancing industry practices.
Latest Patents
Among his recent innovations is the "Abrasive Slurry Regeneration Method," designed to efficiently regenerate abrasive slurries used in polishing silicon oxide. This method presents a regeneration step that collects specific additives and maintains the abrasive concentration within defined parameters. Another notable patent is for a "Detection Chip, Detection Kit, Detection System, and Method for Detecting Detection Target Substance." This invention integrates a light-transmitting substrate with a localized surface plasmon resonance (LSPR) structure, significantly enhancing the detection capabilities for various substances.
Career Highlights
Maezawa has made significant contributions while working for recognized companies, including Konica Minolta, Inc. and Konica Corporation. His expertise in research and development has been pivotal in driving forward the innovative technologies in these organizations.
Collaborations
Throughout his career, Akihiro Maezawa has collaborated with esteemed colleagues such as Noriyuki Mishina and Yuuki Nagai. Their combined efforts in research and development have further expanded the horizons of their respective projects.
Conclusion
Akihiro Maezawa stands out as a noteworthy inventor who has made substantial contributions to technology and innovation. With a robust portfolio of patents and significant industry collaborations, he continues to be a driving force in the advancement of modern technological solutions. His work not only reflects his genius but also inspires future generations of inventors and innovators.