The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 10, 2018

Filed:

Dec. 17, 2012
Applicant:

Konica Minolta, Inc., Chiyoda-ku, JP;

Inventors:

Atsushi Takahashi, Hachioji, JP;

Yuuki Nagai, Tachikawa, JP;

Akihiro Maezawa, Hino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/52 (2006.01); B01D 21/02 (2006.01); B24B 57/02 (2006.01); C09K 3/14 (2006.01); B28D 5/00 (2006.01); B01D 11/02 (2006.01);
U.S. Cl.
CPC ...
C09K 3/1409 (2013.01); B01D 11/0246 (2013.01); B24B 57/02 (2013.01); B28D 5/007 (2013.01); C02F 1/5209 (2013.01); C02F 1/5236 (2013.01); C09K 3/14 (2013.01); B01D 21/02 (2013.01); B01D 2221/14 (2013.01); Y02P 70/179 (2015.11);
Abstract

Method for separating a polishing material, which is capable of separating and recovering cerium oxide from a used polishing material that is mainly composed of cerium oxide and a regenerated polishing material which can be obtained by the separation method. This method for separating a polishing material is characterized in that a divalent alkaline earth metal salt is added into the slurry of the used polishing material, while controlling the temperature of the slurry within the range of 10-70 DEG C., thereby causing the polishing material to aggregate under such conditions that the mother liquor has a pH of less than 10.0 as the pH is converted to one at 25 DEG C. so that the polishing material is separated from the mother liquor.


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