The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2019

Filed:

Mar. 09, 2016
Applicant:

Konica Minolta, Inc., Tokyo, JP;

Inventors:

Chie Inui, Hino, JP;

Akihiro Maezawa, Hino, JP;

Yuuki Nagai, Tachikawa, JP;

Natsumi Hirayama, Hino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/02 (2012.01); B24B 37/24 (2012.01); B24B 37/34 (2012.01); B24B 57/00 (2006.01); B24B 57/02 (2006.01);
U.S. Cl.
CPC ...
B24B 57/00 (2013.01); B24B 37/02 (2013.01); B24B 37/24 (2013.01); B24B 37/34 (2013.01); B24B 57/02 (2013.01);
Abstract

A method for collecting an abrasive from an abrasive slurry which has been used for polishing an object including silicon as a main component includes: (i) adding a solvent to the abrasive slurry; (ii) dissolving particles of the polished object among components of the polished object contained in the abrasive slurry; and (iii) filtering the abrasive slurry to collect the abrasive, in which the steps (i) to (iii) are carried out without a pH adjuster to remove components of the polished object to collect the abrasive.


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