The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2018

Filed:

Apr. 16, 2014
Applicant:

Konica Minolta, Inc., Chiyoda, JP;

Inventors:

Yuuki Nagai, Tachikawa, JP;

Akihiro Maezawa, Hino, JP;

Chie Inui, Hino, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 21/01 (2006.01); B24B 55/12 (2006.01); C02F 1/52 (2006.01);
U.S. Cl.
CPC ...
B24B 55/12 (2013.01); B01D 21/01 (2013.01); C02F 1/52 (2013.01);
Abstract

A diamond abrasive recovery method in which diamond abrasive is recovered from polishing material slurry including diamond abrasive used for polishing a polishing target mainly composed of silicon. The method comprises (1) recovering polishing material slurry including the used diamond abrasive; (2) adding inorganic salt including a metallic element which is to be a divalent or trivalent cation to the recovered polishing material slurry to aggregate the diamond abrasive and separating a supernatant liquid from a diamond abrasive included dispersion medium; and (3) extracting diamond abrasive from the separated diamond abrasive included dispersion medium using a low polarity dispersion medium.


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