Ajay Baranwal

USPTO Granted Patents = 11 (Patent Applications = 7)

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 11(Granted Patents)

Company Filing History:

5 out of 5

Center for Deep Learning in Electronics Manufacturing, Inc.

Center for Deep Learning Inelectronics Mfg., Inc.

patent

Years Active: 2020-2025

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11 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12340495 - Method for computational metrology and inspection for patterns to be manufactured on a substrate (2025-06-24),

2. 12288022 - Methods and systems for generating shape data for electronic designs (2025-04-29),

3. 12287567 - Method and system for reticle enhancement technology (2025-04-29),

4. 12045996 - Methods and systems for registering images for electronic designs (2024-07-23),

5. 11921420 - Method and system for reticle enhancement technology (2024-03-05),

6. 11847400 - Methods and systems for generating shape data for electronic designs (2023-12-19),

7. 11823423 - Methods and systems for compressing shape data for electronic designs (2023-11-21),

8. 11264206 - Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography (2022-03-01),

9. 11250199 - Methods and systems for generating shape data for electronic designs (2022-02-15),

10. 11182929 - Methods and systems for compressing shape data for electronic designs (2021-11-23),

11. 10592634 - Systems and methods for automatic handling of engineering design parameter violations (2020-03-17),

Title: The Innovative Mind of Ajay Baranwal

Introduction

Ajay Baranwal is a prominent inventor based in Dublin, California. He has made significant contributions to the field of computational metrology and inspection, holding a total of 11 patents. His work focuses on enhancing manufacturing processes through advanced technologies.

Latest Patents

One of Ajay Baranwal's latest patents is a method for computational metrology and inspection for patterns to be manufactured on a substrate. This method includes generating a scanner aerial image using a neural network, which is derived from a mask inspection image produced by a mask inspection machine. The process involves training the neural network with a variety of images, including simulated scanner aerial images and other related images.

Another notable patent is the method and system for reticle enhancement technology. This innovation incorporates variable side wall angle (VSA) into calculated patterns, utilizing a mask 3D (M3D) effect. The method includes inputting mask exposure information to determine the M3D effect, which may involve calculating the VSA and subsequently calculating a pattern on a substrate that reflects this effect.

Career Highlights

Ajay Baranwal has worked with several notable companies, including the Center for Deep Learning in Electronics Manufacturing, Inc. and D2s, Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in the industry.

Collaborations

Throughout his career, Ajay has collaborated with talented individuals such as Thang Nguyen and Suhas Pillai. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Ajay Baranwal's contributions to the field of computational metrology and inspection are noteworthy. His innovative patents and collaborative efforts highlight his commitment to advancing technology in manufacturing processes. His work continues to influence the industry and inspire future innovations.

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7 patents pending:

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