The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2025
Filed:
Aug. 02, 2022
Applicant:
D2s, Inc., San Jose, CA (US);
Inventors:
Linyong Pang, Monte Sereno, CA (US);
Jocelyn Blair, Campbell, CA (US);
Ajay Baranwal, Dublin, CA (US);
Assignee:
D2S, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G03F 1/84 (2012.01); G06N 3/045 (2023.01); G06T 7/70 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G03F 1/84 (2013.01); G06N 3/045 (2023.01); G06T 7/70 (2017.01); G06T 2207/10032 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Methods include generating a scanner aerial image using a neural network, where the scanner aerial image is generated using a mask inspection image that has been generated by a mask inspection machine. Embodiments also include training the neural network with a set of images, such as with a simulated scanner aerial image and another image selected from a simulated mask inspection image, a simulated Critical Dimension Scanning Electron Microscope (CD-SEM) image, a simulated scanner emulator image and a simulated actinic mask inspection image.