Aihua Chen

Title: Aihua Chen - Innovator in Tungsten Nitride Atomic Layer Deposition

Introduction

Aihua Chen, based in San Jose, CA, is a prominent inventor with a commendable portfolio of 22 patents. His cutting-edge work primarily focuses on semiconductor fabrication processes, particularly in the area of tungsten barrier materials. His innovative contributions have significantly enhanced the performance of electronic devices.

Latest Patents

One of Aihua Chen's latest patents addresses tungsten nitride atomic layer deposition processes. The method involves depositing a tungsten layer on a substrate during a vapor deposition process. This is followed by sequential exposure of the substrate to a tungsten precursor and a nitrogen precursor, leading to the formation of a tungsten nitride layer on the tungsten layer. This process provides notable features, such as a tungsten layer thickness of about 50 angstroms or less and an electrical resistivity of approximately 380 μΩ-cm or less for the tungsten nitride layer. Additionally, other methods in this patent describe depositing a tungsten bulk layer on the tungsten nitride layer by employing a chemical vapor deposition process.

Career Highlights

Aihua Chen is affiliated with Applied Materials, Inc., a leading company in the development of materials engineering solutions for the semiconductor and display industries. His role in advancing vacuum deposition technologies and barriers in semiconductor devices has solidified his reputation as a key player in the innovation landscape.

Collaborations

Throughout his career, Aihua Chen has collaborated with several notable industry professionals, including Lee Luo and Shulin Wang. These partnerships demonstrate his commitment to working with other experts in the field to drive innovation and achieve impactful results in semiconductor technologies.

Conclusion

Aihua Chen's contributions to tungsten nitride atomic layer deposition exemplify the essence of innovation within the semiconductor industry. With an impressive array of patents and ongoing collaboration with notable professionals, Aihua continues to make strides that shape the future of electronic devices. His work not only enhances the performance of current technologies but also paves the way for future advancements in the field.