Location History:
- Tualatin, OR (US) (2015)
- Portland, OR (US) (2012 - 2018)
Company Filing History:
Years Active: 2012-2018
Title: Adrien LaVoie - Innovator in Vapor Delivery and Atomic Layer Deposition
Introduction
Adrien LaVoie, an accomplished inventor based in Portland, OR, has significantly contributed to the fields of vapor delivery and atomic layer deposition. With a remarkable portfolio that includes 16 patents, he has developed innovative systems that enhance substrate processing technologies. His work focuses on improving the efficiency and precision of film deposition processes used in various industries.
Latest Patents
Two of Adrien's latest patents showcase his expertise in advanced substrate processing techniques. The first, titled "Systems and methods for vapor delivery in a substrate processing system," presents a sophisticated vapor delivery system that consists of an ampoule for liquid precursor storage and a heater designed to vaporize the liquid. This system also incorporates various valves for controlled communication and distribution, ensuring precise application during the substrate processing.
The second patent, "Inhibitor plasma mediated atomic layer deposition for seamless feature fill," outlines a method that involves a two-step atomic layer deposition process. Following the initial deposition, the substrate is exposed to an inhibitor plasma to create a variably passivated surface, facilitating a second deposition step that optimizes film quality on intricate features.
Career Highlights
Adrien LaVoie's career includes significant tenures at notable companies such as Novellus Systems Incorporated and Lam Research Corporation. His roles at these organizations allowed him to refine his skills and contribute to groundbreaking innovations in manufacturing technologies, particularly in deposition processes essential for semiconductor fabrication.
Collaborations
Throughout his career, Adrien has collaborated with esteemed colleagues, including Hu Kang and Shankar Swaminathan. Working alongside such talented individuals has allowed him to exchange ideas and drive forward the frontiers of technology in his field.
Conclusion
Adrien LaVoie's contributions to vapor delivery and atomic layer deposition reflect a deep understanding of substrate processing systems. Through his innovative patents and collaborations, he continues to influence the industry and pave the way for future advancements in film deposition technology. His work serves as an inspiration for budding inventors and engineers aiming for excellence in technical innovation.