This inventor holds 4 USPTO granted patents. Top assignees: Micron Technology Incorporated, Process Technologies, Inc.. Active years: 1998-2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998-2011
Title: The Innovative Contributions of Adam J Regner, III
Introduction
Adam J Regner, III is a notable inventor based in Meridian, ID (US). He has made significant contributions to the field of electroless plating, holding a total of 4 patents. His work has had a considerable impact on semiconductor manufacturing processes.
Latest Patents
One of his latest patents is an electroless plating bath composition and method of use. This innovative composition comprises succinic acid, potassium carbonate, a source of cobalt metal ions, a reducing agent, and water. An optional buffering agent may also be included in the composition. This formulation is designed to deposit cobalt metal in or on semiconductor substrate surfaces, including vias, trenches, and interconnects.
Career Highlights
Throughout his career, Adam has worked with several prominent companies, including Process Technologies, Inc. and Micron Technology Incorporated. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.
Collaborations
Adam has collaborated with notable coworkers such as Theodore S Weigold and John D Ferrell. These partnerships have fostered a creative environment that has led to innovative solutions in the field.
Conclusion
Adam J Regner, III is a distinguished inventor whose work in electroless plating has advanced semiconductor technology. His patents and collaborations reflect his commitment to innovation and excellence in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile