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San-Apro Limited

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USPTO Granted Patents = 24

% Expired Patents = 8.3

EPO Patents = 10

Forward Citations = 61

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37 inventors (with patents filed for the assignee):

Hideki Kimura (8 out of 10 patents)

Nobuyasu Nakasugi (6 out of 7 patents)

Yusaku Takashima (4 out of 4 patents)

4. Yuji Nakamura (4 out of 4 patents)

5. Jiro Yamamoto (4 out of 4 patents)

6. Takuto Nakao (4 out of 4 patents)

7. Issei Suzuki (3 out of 10 patents)

8. Atsushi Shiraishi (3 out of 4 patents)

9. Masashi Date (3 out of 10 patents)

10. Noriya Fukunaga (2 out of 2 patents)

11. Takuya Ikeda (2 out of 14 patents)

12. Shinji Yamashita (2 out of 2 patents)

13. Keiichi Nakatani (2 out of 5 patents)

14. Yoshihiko Akazawa (1 out of 8 patents)

15. Yoshitaka Komuro (1 out of 43 patents)

24 patents: Sort by Forward Citations

1. 12730374 - Photoacid generator, and photosensitive composition using same (2026-09-08),

2. 12662450 - Onium salt and photoacid generator (2026-06-23),

3. 12461444 - Sulfonium salt, photoacid generator, curable composition, and resist composition (2025-11-04),

4. 12422747 - Negative photosensitive resin composition, pattern formation method, and laminated film (2025-09-23),

5. 12129240 - Sulfonium salt, photoacid generator, curable composition and resist composition (2024-10-29),

6. 11926581 - Sulfonium salt, photoacid generator, curable composition, and resist composition (2024-03-12),

7. 11370751 - Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof (2022-06-28),

8. 10683266 - Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof (2020-06-16),

9. 10450266 - Sulfonate compound, photoacid generator, and resin composition for photolithography (2019-10-22),

10. 9933701 - Photobase generator (2018-04-03),

11. 9045398 - Sulfonium salt and photo-acid generator (2015-06-02),

12. 8617787 - Sulfonium salt, photo-acid generator, and photosensitive resin composition (2013-12-31),

13. 8338074 - Actinic radiation-curable stereolithographic resin composition having improved stability (2012-12-25),

14. 8329771 - Photobase generator (2012-12-11),

15. 8278030 - Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof (2012-10-02),

Company Overview

San-Apro Limited, based in Kyoto, Japan, specializes in the development and manufacturing of advanced materials and components for various industries. The company focuses on innovative solutions in the fields of electronics and precision engineering, contributing to advancements in technology and product performance. With a commitment to research and development, San-Apro plays a significant role in enhancing the functionality and efficiency of products across multiple sectors, including consumer electronics and industrial applications.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

24 Patents

#85 in Kyoto 615-0031

#2,636 in Japan

#26,701 in the World

San-Apro Limited

Forward Citations = 61

37 inventors:

Hideki Kimura (8 out of 10 patents)

Nobuyasu Nakasugi (6 out of 7 patents)

Yusaku Takashima (4 out of 4 patents)

4. Yuji Nakamura (4 out of 4 patents)

5. Jiro Yamamoto (4 out of 4 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: San-Apro Limited. Retrieved from https://idiyas.com/company/san-apro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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