The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2024

Filed:

Apr. 09, 2019
Applicant:

San-apro Ltd., Kyoto, JP;

Inventors:

Takuto Nakao, Kyoto, JP;

Yusaku Takashima, Kyoto, JP;

Assignee:

SAN-APRO LIMITED, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 381/12 (2006.01); G03F 7/038 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
C07C 381/12 (2013.01); G03F 7/0382 (2013.01); G03F 7/094 (2013.01); G03F 7/2002 (2013.01); G03F 7/2039 (2013.01);
Abstract

The sulfonium salt has high photosensitivity to i-rays and high compatibility with cationically polymerizable compounds such as epoxy compounds, and is excellent storage stability in formulations containing such compounds. The sulfonium salt is represented by general formula (1). In formula (1), R represents an alkyl group or an aryl group; substituents, R1 to R5, each independently represent an alkyl group, a hydroxy group, an alkoxy group, an aryl group, an aryloxy group, a hydroxy(poly)alkyleneoxy group, or a halogen atom; R6 to R9 each independently represent an alkyl group, an aryl group, or a hydrogen atom; mto meach represent the number of occurrences of each of R1 to R5, mand mrepresent an integer of 0 to 3, mand mrepresent an integer of 0 to 4, mrepresents an integer of 0 to 5, and Xrepresents a monovalent polyatomic anion.


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