The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2025
Filed:
Jan. 04, 2021
Applicant:
San-apro Ltd., Kyoto, JP;
Inventors:
Takuto Nakao, Kyoto, JP;
Yuji Nakamura, Kyoto, JP;
Assignee:
SAN-APRO LTD., Kyoto, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 309/06 (2006.01); C07C 381/12 (2006.01); C07F 7/18 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/06 (2013.01); C07C 381/12 (2013.01); C07F 7/1804 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01);
Abstract
Provided are: a new sulfonium salt highly photosensitive to active energy ray, in particular, i-line or h-line; and a new photoacid generator which is highly photosensitive to i-line or h-line, and comprises a sulfonium salt that is highly soluble in a solvent and a cationically polymerizable compound such as an epoxy compound, and has excellent storage stability in the formulation. The present invention pertains to a sulfonium salt represented by general formula (1), and a photoacid generator comprising said sulfonium salt.