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Suwon, South Korea

Samsung Corning Co., Ltd.

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USPTO Granted Patents = 53

% Expired Patents = 54.7

Forward Citations = 312

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125 inventors (with patents filed for the assignee):

Kyoung Mun Choo (6 out of 6 patents)

Chang Ho Noh (4 out of 26 patents)

Euk Che Hwang (4 out of 14 patents)

4. Sung Hen Cho (4 out of 16 patents)

5. Ki Yong Song (4 out of 23 patents)

6. Sung-soo Park (3 out of 19 patents)

7. Jai-yong Han (3 out of 10 patents)

8. Hae Yong Lee (3 out of 3 patents)

9. Jae Seon Kim (3 out of 3 patents)

10. Chang Ho Lee (3 out of 67 patents)

11. Dong-Woo Kim (2 out of 57 patents)

12. Tae-soon Park (2 out of 4 patents)

13. Gue Chul Jang (2 out of 2 patents)

14. Hyo Keun Lee (2 out of 2 patents)

15. Jin Heong Yim (2 out of 18 patents)

Core Competencies:

Electromagnetic Shielding

Gallium Nitride

Display Filters

Plasma Display Panel

Thin Film Deposition

Cathode Ray Tube

Nanoporous Material

Optical Filters

High-Transmittance

Surface Light Source

Sealing Glass Composition

Field Emission Array

53 patents: Sort by Forward Citations

1. 7679275 - Display filter and display device including the same (2010-03-16),

2. 7674534 - Electromagnetic wave shielding filter, method of manufacturing the same, PDP apparatus including the same filter (2010-03-09),

3. 7655873 - Electromagnetic shielding film, plasma display panel filter using the electromagnetic shielding film, plasma display panel device including the electromagnetic shielding film, and method of manufacturing the electromagnetic shielding film (2010-02-02),

4. 7621998 - Single crystalline gallium nitride thick film having reduced bending deformation (2009-11-24),

5. 7592629 - Gallium nitride thin film on sapphire substrate having reduced bending deformation (2009-09-22),

6. 7518151 - Gallium nitride/sapphire thin film having reduced bending deformation (2009-04-14),

7. 7517917 - Composition for preparing nanoporous material comprising calixarene derivative (2009-04-14),

8. 7494926 - Method for forming highly conductive metal pattern on flexible substrate and EMI filter using metal pattern formed by the method (2009-02-24),

9. 7466077 - Filter assembly, method of manufacturing the same, and plasma display panel using the same (2008-12-16),

10. 7462893 - Method of fabricating GaN (2008-12-09),

11. 7459549 - Composition for preparing nanoporous material (2008-12-02),

12. 7449066 - Apparatus for fabrication of GaN bulk single crystal and fabrication method of GaN single crystal ingot using the same (2008-11-11),

13. 7435666 - Epitaxial growth method (2008-10-14),

14. 7407865 - Epitaxial growth method (2008-08-05),

15. 7315045 - Sapphire/gallium nitride laminate having reduced bending deformation (2008-01-01),

Company Overview

Samsung Corning Co., Ltd., headquartered in Suwon, South Korea, specializes in advanced display technology, focusing on innovative solutions for various display applications. The company is known for its expertise in electromagnetic shielding, gallium nitride, and optical filters, contributing to the development of high-performance displays. With a strong emphasis on research and development, Samsung Corning also explores thin film deposition and nanomaterials, positioning itself at the forefront of display technology advancements.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 27 2026

53 Patents

#10 in Suwon

#308 in South Korea

#13,356 in the World

Suwon, South Korea

Samsung Corning Co., Ltd.

Forward Citations = 312

125 inventors:

Kyoung Mun Choo (6 out of 6 patents)

Chang Ho Noh (4 out of 26 patents)

Euk Che Hwang (4 out of 14 patents)

4. Sung Hen Cho (4 out of 16 patents)

5. Ki Yong Song (4 out of 23 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Samsung Corning Co., Ltd.. Retrieved from https://idiyas.com/company/samsung-corning-company

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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