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Jenoptik Optical Systems Gmbh

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USPTO Granted Patents = 61

% Expired Patents = 23.0

EPO Patents = 45

Trademarks = 7

Forward Citations = 51

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80 inventors (with patents filed for the assignee):

Torsten Erbe (13 out of 13 patents)

Jan Werschnik (7 out of 8 patents)

Lutz Reichmann (6 out of 8 patents)

4. Uwe Schaller (5 out of 8 patents)

5. Marco Bornschein (5 out of 5 patents)

6. Stephan Fahr (4 out of 5 patents)

7. Marc D Himel (4 out of 4 patents)

8. Stefan Franz (4 out of 14 patents)

9. Tobias Gnausch (4 out of 5 patents)

10. Markus Augustin (3 out of 3 patents)

11. Juergen Wolf (3 out of 4 patents)

12. Joerg Wunderlich (3 out of 3 patents)

13. Meik Panitz (3 out of 3 patents)

14. Matthias Bening (3 out of 3 patents)

15. Ullrich Krueger (3 out of 4 patents)

Core Competencies:

Optical Device

Camera Shutter

LIDAR Scanner

Wavefront Correction

Optoelectronic Chips

Beam Expander

Diode Laser

Optical Mount

Microchip Production

Thermal Stability

Lens Mount

Polarization System

61 patents: Sort by Forward Citations

1. 12642059 - Method of producing an etching mask, method of etching a structure into a substrate, use of a tetrel layer and structure for producing a mask (2026-05-26),

2. 12622095 - Optical device and method for producing an optical device (2026-05-05),

3. 12338183 - Method for integrally bonding a glass element to a support element, and optical device (2025-06-24),

4. 12228851 - Camera shutter device having a two-armed lever (2025-02-18),

5. 12210057 - Wafer-level test method for optoelectronic chips (2025-01-28),

6. 12203983 - Contacting module for contacting optoelectronic chips (2025-01-21),

7. 12044958 - Camera shutter device with permanent magnets (2024-07-23),

8. 12002859 - Semiconductor device and method for producing a substrate for a semiconductor component, and use of indium during production of same (2024-06-04),

9. 11789233 - Objective, use of an objective, measurement system comprising an objective and use of a bi-aspherical plastic lens in an objective (2023-10-17),

10. 11764539 - Transmitting device for a LIDAR scanner having a scanning mirror covered by a cover element (2023-09-19),

11. 11712753 - Method for making a thermally stable connection between a glass element and a support element, method for producing an optical device, and optical device (2023-08-01),

12. 11557881 - Diode laser (2023-01-17),

13. 11522335 - Transmitting device with a scanning mirror covered by a collimating cover element (2022-12-06),

14. 11480495 - Position-tolerance-insensitive contacting module for contacting optoelectronic chips (2022-10-25),

15. 11463675 - Light-source characterizer and associated methods (2022-10-04),

Company Overview

Jenoptik Optical Systems GmbH, based in Jena, Germany, specializes in the development and manufacturing of advanced optical devices. The company focuses on a range of technologies including camera shutters, LIDAR scanners, and wavefront correction systems. Their expertise extends to optoelectronic chips, beam expanders, diode lasers, and optical mounts, catering to various industries such as automotive, medical, and industrial applications. Jenoptik is committed to innovation in optical technologies, enhancing precision and performance across its product offerings.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Nov 3 2026

61 Patents

#7 in Jena

#905 in Germany

#11,931 in the World

Jenoptik Optical Systems Gmbh

Forward Citations = 51

80 inventors:

Torsten Erbe (13 out of 13 patents)

Jan Werschnik (7 out of 8 patents)

Lutz Reichmann (6 out of 8 patents)

4. Uwe Schaller (5 out of 8 patents)

5. Marco Bornschein (5 out of 5 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Jenoptik Optical Systems Gmbh. Retrieved from https://idiyas.com/company/jenoptik-optical-systems

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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