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Corvallis, OR, United States of America

Inpria Corporation

USPTO Granted Patents = 67

EPO Patents = 7

Trademarks = 3

Forward Citations = 945

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43 inventors (with patents filed for the assignee):

Stephen T Meyers (35 out of 35 patents)

Kai Jiang (35 out of 35 patents)

Jeremy T Anderson (35 out of 39 patents)

4. Douglas A Keszler (33 out of 56 patents)

5. Brian J Cardineau (28 out of 28 patents)

6. Alan J Telecky (27 out of 27 patents)

7. Joseph Burton Edson (20 out of 20 patents)

8. Andrew Grenville (19 out of 19 patents)

9. Jason K Stowers (17 out of 19 patents)

10. Michael K Kocsis (11 out of 15 patents)

11. William Earley (10 out of 10 patents)

12. Benjamin L Clark (10 out of 19 patents)

13. Dominick Smiddy (7 out of 7 patents)

14. Thomas J Lamkin (7 out of 7 patents)

15. Peter De Schepper (7 out of 9 patents)

Core Competencies:

Organometallic Compositions

Photoresist Developer Compositions

High Resolution Patterning

Organotin Patterning Materials

EUV Absorption Coatings

Integrated Circuit Manufacturing

Radiation Based Patterning

Monoalkyl Tin Compounds

Inorganic Resist Patterning

Thrombectomy Devices

Lithography Templates

Stable Solutions of Alkoxides

67 patents: Sort by Forward Citations

1. 12498641 - Process environment for inorganic resist patterning (2025-12-16),

2. 12487522 - Organometallic solution based high resolution patterning compositions and corresponding methods (2025-12-02),

3. 12443105 - Organotin oxide hydroxide patterning compositions, precursors, and patterning (2025-10-14),

4. 12416861 - Organometallic photoresist developer compositions and processing methods (2025-09-16),

5. 12399426 - Patterned organometallic photoresists and methods of patterning (2025-08-26),

6. 12360454 - Stabilized interfaces of inorganic radiation patterning compositions on substrates (2025-07-15),

7. 12338260 - Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods (2025-06-24),

8. 12298666 - Organotin patterning materials with ligands having silicon/germanium; precursor compositions; and synthesis methods (2025-05-13),

9. 12276913 - Organotin oxide hydroxide patterning compositions, precursors, and patterning (2025-04-14),

10. 12235578 - Organometallic solution based high resolution patterning compositions (2025-02-25),

11. 12189286 - Organometallic solution based high resolution patterning compositions (2025-01-07),

12. 12180240 - Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods (2024-12-31),

13. 12129271 - Organotin clusters, solutions of organotin clusters, and application to high resolution patterning (2024-10-29),

14. 12112948 - Method of manufacturing integrated circuit device using a metal-containing photoresist composition (2024-10-08),

15. 12105418 - Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products (2024-10-01),

Inpria Corporation is a semiconductor materials company that develops and commercializes advanced photoresists for extreme ultraviolet (EUV) lithography. Their proprietary technology enables the production of high-resolution patterning chips for the semiconductor industry. With a focus on innovation, Inpria aims to provide solutions that drive the continuous advancement of semiconductor manufacturing processes.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

67 Patents

#4 in Corvallis, OR

#67 in Oregon

#5,228 in US

#10,618 in the World

Corvallis, OR, United States of America

Inpria Corporation

Forward Citations = 945

43 inventors:

Stephen T Meyers (35 out of 35 patents)

Kai Jiang (35 out of 35 patents)

Jeremy T Anderson (35 out of 39 patents)

4. Douglas A Keszler (33 out of 56 patents)

5. Brian J Cardineau (28 out of 28 patents)

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