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For the Inventor, By the Inventor

Corvallis, OR, United States of America

Inpria Corporation


USPTO Granted Patents = 75

% Expired Patents = 1.3


Trademarks = 3

Forward Citations = 1,133

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46 inventors (with patents filed for the assignee):

goldMedal Stephen T Meyers (38 out of 38 patents)

silverMedal Kai Jiang (37 out of 37 patents)

bronzeMedal Jeremy T Anderson (37 out of 41 patents)

4.  Douglas A Keszler (35 out of 58 patents)

5.  Brian J Cardineau (33 out of 36 patents)

6.  Alan J Telecky (30 out of 30 patents)

7.  Joseph Burton Edson (23 out of 23 patents)

8.  Andrew Grenville (20 out of 20 patents)

9.  Jason K Stowers (19 out of 21 patents)

10.  William Earley (12 out of 12 patents)

11.  Michael K Kocsis (12 out of 16 patents)

12.  Benjamin L Clark (11 out of 20 patents)

13.  Thomas J Lamkin (9 out of 9 patents)

14.  Peter De Schepper (9 out of 11 patents)

15.  Dominick Smiddy (8 out of 8 patents)


Core Competencies:
Organometallic
Photoresist
Patterning
EUV Absorption
High Resolution
Radiation
Tin Dodecamers
Monoalkyl Tin
Inorganic Resists
Lithography
Patterned Layers
Metal Residue

75 patents:

1. 12687778 - Gas-based development of organometallic resist in an oxidizing halogen-donating environment (2026-07-21),
2. 12631961 - Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low metal contamination and/or particulate contamination, and corresponding methods (2026-05-19),
3. 12630737 - Radiation sensitive organotin compositions having oxygen heteroatoms in hydrocarbyl ligand (2026-05-19),
4. 12595272 - Methods to produce organotin compositions with convenient ligand providing reactants (2026-04-07),
5. 12578646 - Organotin oxide hydroxide patterning compositions, precursors, and patterning (2026-03-17),
6. 12566377 - Multiple patterning with organometallic photopatternable layers with intermediate freeze steps (2026-03-03),
7. 12554195 - Radiation based patterning methods (2026-02-17),
8. 12522621 - Tin dodecamers and radiation patternable coatings with strong euv absorption (2026-01-13),
9. 12498641 - Process environment for inorganic resist patterning (2025-12-16),
10. 12487522 - Organometallic solution based high resolution patterning compositions and corresponding methods (2025-12-02),
11. 12443105 - Organotin oxide hydroxide patterning compositions, precursors, and patterning (2025-10-14),
12. 12416861 - Organometallic photoresist developer compositions and processing methods (2025-09-16),
13. 12399426 - Patterned organometallic photoresists and methods of patterning (2025-08-26),
14. 12360454 - Stabilized interfaces of inorganic radiation patterning compositions on substrates (2025-07-15),
15. 12338260 - Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods (2025-06-24),
Inpria Corporation, based in Corvallis, Oregon, specializes in the development of advanced organometallic patterning materials for semiconductor manufacturing. The company focuses on innovative photoresist technologies that enhance extreme ultraviolet (EUV) lithography processes, enabling high-resolution patterning essential for next-generation electronic devices. By leveraging unique compounds such as tin dodecamers and monoalkyl tin, Inpria aims to improve radiation absorption and overall performance in the semiconductor industry.
Profile summary based on public USPTO records.

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USPTO Data Jan 1 1976 - Sep 29 2026

Inpria Corporation
75 Patents

#4 in Corvallis, OR

#60 in Oregon

#4,900 in US

#9,996 in the World

Corvallis, OR (US)
Corvallis, OR, United States of America

Inpria Corporation

Forward Citations = 1,133

46 inventors:

goldMedal Stephen T Meyers (38 out of 38 patents)

silverMedal Kai Jiang (37 out of 37 patents)

bronzeMedal Jeremy T Anderson (37 out of 41 patents)

4.  Douglas A Keszler (35 out of 58 patents)

5.  Brian J Cardineau (33 out of 36 patents)

Please report any incorrect information to [email protected]
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