The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
Mar. 05, 2024
Inpria Corporation, Corvallis, OR (US);
Alan J. Telecky, Albany, OR (US);
Jason K. Stowers, Corvallis, OR (US);
Douglas A. Keszler, Corvallis, OR (US);
Stephen T. Meyers, Corvallis, OR (US);
Peter De Schepper, Wijnegem, BE;
Sonia Castellanos Ortega, Leuven, BE;
Michael Greer, Corvallis, OR (US);
Kirsten Louthan, Philomath, OR (US);
Inpria Corporation, Corvallis, OR (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
The processing of radiation patternable organometallic coatings is shown to be improved through the appropriate selection of post processing conditions between coating and development of the pattern. In particular, a coated wafer can be subjected to process delays to allow aging of the coating at various process points, in particular following irradiation. Process delays can be combined and interspersed with heating steps. The atmosphere above the coated wafer at various process steps can be adjusted to obtain desired improvements in the development of the pattern. Reactive gases can be beneficial with respect to improvement of coating properties.