The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2026

Filed:

Feb. 28, 2022
Applicant:

Inpria Corporation, Corvallis, OR (US);

Inventors:

Robert E. Jilek, Philomath, OR (US);

Brian J. Cardineau, Corvallis, OR (US);

Kierra Huihui-Gist, Albany, OR (US);

Stephen T. Meyers, Corvallis, OR (US);

Assignee:

Inpria Corporation, Corvallis, OR (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07F 7/22 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
C07F 7/2284 (2013.01); C07F 7/2224 (2013.01); G03F 7/162 (2013.01); G03F 7/2004 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01);
Abstract

Organotin compounds are presented that are represented by the formula RSnL, wherein R is a deuterated hydrocarbyl group and L is a hydrolysable ligand. Two different synthesis techniques are described for synthesizing these compositions. A first method involves reacting a primary halide hydrocarbyl compound (R—X, where X is a halide atom) with an organometallic composition comprising SnLmoieties associated with metal cations M, where M is an alkali metal, alkaline earth metal, and/or pseudo-alkaline earth metal (Zn, Cd, or Hg), and L is either an amide ligand resulting in an alkali metal tin triamide compound or an acetylide ligand resulting in an alkali metal tin triacetylide, to form correspondingly a monohydrocarbyl tin triamide (RSn(NR')) or a monohydrocarbyl tin triacetylide (RSn(C═CR)). An alternative approach involves reacting a Grignard reagent RMgX with SnLin a solution comprising an organic solvent to form a monoorgano tin tralkylamide, a monoorgano tin trialkoxide, monoorgano tin tri acetylide or monoorgano tin tricarboxylate. The compositions are useful for radiation patterning, especially with EUV radiation.


Find Patent Forward Citations

Jilek, Robert. (2026). Deuterated organotin compounds, methods of synthesis and radiation patterning (U.S. Patent No. 12774295). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12774295

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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