Robert E Jilek

Title: The Innovations of Robert E. Jilek

Introduction

Robert E. Jilek is a notable inventor based in Philomath, Oregon. He has made significant contributions to the field of materials science, particularly in the development of photosensitive compositions. With a total of 2 patents to his name, Jilek's work is recognized for its innovative approach to radiation-based patterning technologies.

Latest Patents

Jilek's latest patents focus on organotin patterning materials with ligands that incorporate silicon and germanium. One of his key inventions describes a photosensitive composition that comprises RSnL, where R is a hydrocarbyl ligand with 1-20 carbon atoms and one or more silicon and/or germanium heteroatoms. The ligand L is an acetylide ligand, represented as —C≡CA, where A can be a silyl group or an organo group. The methods outlined in his patents detail the synthesis of these compositions by reacting RX, where X is a halide, with MSnL, where M is an alkali metal or similar. These radiation-sensitive compositions are particularly effective for patterning applications using extreme ultraviolet (EUV) light.

Career Highlights

Jilek is currently associated with Inpria Corporation, a company that specializes in advanced materials for semiconductor manufacturing. His work at Inpria has positioned him as a key player in the development of innovative materials that enhance the capabilities of modern lithography techniques.

Collaborations

Throughout his career, Jilek has collaborated with talented individuals such as Kai Jiang and Amrit K. Narasimhan. These collaborations have further enriched his research and development efforts, leading to advancements in the field.

Conclusion

Robert E. Jilek's contributions to the field of materials science and his innovative patents highlight his role as a significant inventor. His work continues to influence the development of advanced technologies in semiconductor manufacturing.