The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Jun. 05, 2023
Inpria Corpoartion, Corvallis, OR (US);
Peter De Schepper, Winegem, BE;
Brian J. Cardineau, Corvallis, OR (US);
Inpria Corporation, Corvallis, OR (US);
Abstract
A method provides for performing a dry development of an organotin composition patterned with radiation and having a latent image. The method comprises developing a structure with a gas comprising a halogen based developer and an oxygen source compound, wherein the structure comprises a substrate with layer of composition with a latent image with regions with at least partially condensed tin oxide-hydroxide and separate regions with an organotin composition having carbon-tin bonds, and wherein the developing results in at least partial removal of the organotin composition having carbon-tin bonds. Contact with an oxidizing environment can be performed as a separate step followed by the halogen based thermal development. Suitable apparatuses provide for the desired processing.