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Bunkyo-ku Tokyo, Japan

Hitachi Chemical Dupont Microsystems, Ltd.

USPTO Granted Patents = 27

EPO Patents = 6

Trademarks = 2

Forward Citations = 69

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41 inventors (with patents filed for the assignee):

Masayuki Ooe (11 out of 8 patents)

Hajime Nakano (11 out of 8 patents)

Takumi Ueno (9 out of 6 patents)

4. Tomonori Minegishi (8 out of 13 patents)

5. Yoshiko Tsumaru (8 out of 5 patents)

6. Hiroshi Komatsu (6 out of 5 patents)

7. Dai Kawasaki (6 out of 6 patents)

8. Masataka Nunomura (6 out of 11 patents)

9. Keiko Suzuki (5 out of 5 patents)

10. Keishi Ono (3 out of 3 patents)

11. Masayuki Ohe (3 out of 3 patents)

12. Taku Konno (3 out of 3 patents)

13. Rika Nogita (3 out of 3 patents)

14. Tetsuya Enomoto (2 out of 11 patents)

15. Etsuharu Suzuki (2 out of 2 patents)

27 patents: Sort by Forward Citations

1. 10725379 - Polymide precursor resin composition (2020-07-28),

2. 9751984 - Polyimide precursor, photosensitive resin composition containing said polyimide precursor, and cured-pattern-film manufacturing method and semiconductor device using said photosensitive resin composition (2017-09-05),

3. 9274422 - Photosensitive resin composition, method for forming pattern-cured film using photosensitive resin composition, and electronic component (2016-03-01),

4. 9209128 - Integrated circuit assembly with cushion polymer layer (2015-12-08),

5. 9134608 - Positive photosensitive resin composition, method for producing patterned cured film and electronic component (2015-09-15),

6. 8975192 - Method for manufacturing semiconductor device (2015-03-10),

7. 8871422 - Negative-type photosensitive resin composition, pattern forming method and electronic parts (2014-10-28),

8. 8852726 - Photosensitive polymer composition, method of producing pattern and electronic parts (2014-10-07),

9. 8796411 - Polyimide precursor composition, polyimide film, and transparent flexible film (2014-08-05),

10. 8765868 - Resin composition for insulating film or surface-protective film of electronic components, method for producing pattern-cured film and electronic components (2014-07-01),

11. 8758977 - Negative-type photosensitive resin composition, pattern forming method and electronic parts (2014-06-24),

12. 8614051 - Photosensitive resin composition and circuit formation substrate using the same (2013-12-24),

13. 8420291 - Positive photosensitive resin composition, method for forming pattern, electronic component (2013-04-16),

14. 8304160 - Photosensitive resin composition and circuit formation substrate using the same (2012-11-06),

15. 8304149 - Photosensitive polymer composition, method of forming relief patterns, and electronic equipment (2012-11-06),

Hitachi Chemical Dupont Microsystems, Ltd. is a joint venture between Hitachi Chemical Company and DuPont, specializing in advanced materials and solutions for the semiconductor and electronics industries. The company focuses on developing innovative products such as photoresists, dielectric materials, and other essential components that support the manufacturing of high-performance electronic devices. With a commitment to research and development, Hitachi Chemical Dupont Microsystems aims to meet the evolving needs of the technology sector while ensuring quality and sustainability in its operations.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Jan 20 2026

27 Patents

#46 in Bunkyo-ku Tokyo 112-0004

#2,407 in Japan

#23,347 in the World

Bunkyo-ku Tokyo, Japan

Hitachi Chemical Dupont Microsystems, Ltd.

Forward Citations = 69

41 inventors:

Masayuki Ooe (11 out of 8 patents)

Hajime Nakano (11 out of 8 patents)

Takumi Ueno (9 out of 6 patents)

4. Tomonori Minegishi (8 out of 13 patents)

5. Yoshiko Tsumaru (8 out of 5 patents)

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