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Bunkyo-ku Tokyo, Japan

Hitachi Chemical Dupont Microsystems, Ltd.

USPTO Granted Patents = 27

EPO Patents = 6

Trademarks = 2

Forward Citations = 69

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41 inventors (with patents filed for the assignee):

Masayuki Ooe (11 out of 8 patents)

Hajime Nakano (11 out of 8 patents)

Takumi Ueno (9 out of 6 patents)

4. Tomonori Minegishi (8 out of 13 patents)

5. Yoshiko Tsumaru (8 out of 5 patents)

6. Hiroshi Komatsu (6 out of 5 patents)

7. Dai Kawasaki (6 out of 6 patents)

8. Masataka Nunomura (6 out of 11 patents)

9. Keiko Suzuki (5 out of 5 patents)

10. Keishi Ono (3 out of 3 patents)

11. Masayuki Ohe (3 out of 3 patents)

12. Taku Konno (3 out of 3 patents)

13. Rika Nogita (3 out of 3 patents)

14. Tetsuya Enomoto (2 out of 11 patents)

15. Etsuharu Suzuki (2 out of 2 patents)

27 patents: Sort by Forward Citations

1. 10725379 - Polymide precursor resin composition (2020-07-28),

2. 9751984 - Polyimide precursor, photosensitive resin composition containing said polyimide precursor, and cured-pattern-film manufacturing method and semiconductor device using said photosensitive resin composition (2017-09-05),

3. 9274422 - Photosensitive resin composition, method for forming pattern-cured film using photosensitive resin composition, and electronic component (2016-03-01),

4. 9209128 - Integrated circuit assembly with cushion polymer layer (2015-12-08),

5. 9134608 - Positive photosensitive resin composition, method for producing patterned cured film and electronic component (2015-09-15),

6. 8975192 - Method for manufacturing semiconductor device (2015-03-10),

7. 8871422 - Negative-type photosensitive resin composition, pattern forming method and electronic parts (2014-10-28),

8. 8852726 - Photosensitive polymer composition, method of producing pattern and electronic parts (2014-10-07),

9. 8796411 - Polyimide precursor composition, polyimide film, and transparent flexible film (2014-08-05),

10. 8765868 - Resin composition for insulating film or surface-protective film of electronic components, method for producing pattern-cured film and electronic components (2014-07-01),

11. 8758977 - Negative-type photosensitive resin composition, pattern forming method and electronic parts (2014-06-24),

12. 8614051 - Photosensitive resin composition and circuit formation substrate using the same (2013-12-24),

13. 8420291 - Positive photosensitive resin composition, method for forming pattern, electronic component (2013-04-16),

14. 8304160 - Photosensitive resin composition and circuit formation substrate using the same (2012-11-06),

15. 8304149 - Photosensitive polymer composition, method of forming relief patterns, and electronic equipment (2012-11-06),

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

27 Patents

#44 in Bunkyo-ku Tokyo 112-0004

#2,408 in Japan

#23,293 in the World

Bunkyo-ku Tokyo, Japan

Hitachi Chemical Dupont Microsystems, Ltd.

Forward Citations = 69

41 inventors:

Masayuki Ooe (11 out of 8 patents)

Hajime Nakano (11 out of 8 patents)

Takumi Ueno (9 out of 6 patents)

4. Tomonori Minegishi (8 out of 13 patents)

5. Yoshiko Tsumaru (8 out of 5 patents)

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