The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2015

Filed:

Aug. 22, 2006
Applicants:

Yasunori Kojima, Hitachi, JP;

Toshiaki Itabashi, Tokyo, JP;

Inventors:

Yasunori Kojima, Hitachi, JP;

Toshiaki Itabashi, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); B44C 1/22 (2006.01); H01L 21/302 (2006.01); H01L 21/461 (2006.01); H01L 21/56 (2006.01); H01L 23/31 (2006.01);
U.S. Cl.
CPC ...
H01L 23/3171 (2013.01); H01L 2224/32225 (2013.01); H01L 2924/15311 (2013.01); H01L 21/563 (2013.01); H01L 2924/01078 (2013.01); H01L 2924/0102 (2013.01); H01L 2224/73204 (2013.01); H01L 2924/01079 (2013.01); H01L 2224/16225 (2013.01); H01L 2924/01004 (2013.01); H01L 2224/73203 (2013.01); H01L 23/3128 (2013.01);
Abstract

A method is provided for manufacturing a semiconductor device having a heat-resistant resin film with flip-chip connection structure using a solder bump or a gold bump and an epoxy resin compound laminated thereon, in which adhesiveness is improved particularly after exposure to high temperature and high humidity environments for a long period of time, thereby enhancing the reliability of the semiconductor device. The method, in accordance with the present invention, for manufacturing a semiconductor device having a heat-resistant resin film formed on a semiconductor element and an epoxy resin compound layer laminated thereon, comprises the steps of carrying out a plasma treatment on a surface of the heat-resistant resin film on which the epoxy resin compound layer is laminated using a nitrogen atom-containing gas containing at least one of nitrogen, ammonia, and hydrazine.


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