The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Oct. 29, 2008
Tomonori Minegishi, Ibaraki, JP;
Tomoko Kawamura, Ibaraki, JP;
Masayuki Ohe, Ibaraki, JP;
Yuki Nakamura, Ibaraki, JP;
Tomonori Minegishi, Ibaraki, JP;
Tomoko Kawamura, Ibaraki, JP;
Masayuki Ohe, Ibaraki, JP;
Yuki Nakamura, Ibaraki, JP;
Hitachi Chemical Dupont Microsystems, Ltd., Tokyo, JP;
Abstract
Provided are a positive photosensitive resin composition that is developable in an alkaline aqueous solution and gives a good shaped pattern that is excellent in heat resistance and mechanical property, a method for producing the pattern and an electronic component. The positive photosensitive resin composition contains (a) polybenzoxazole or a polybenzoxazole precursor polymer having a structural unit represented by either a general formula (1) or (2) and satisfying conditions (i) and/or (ii), (b) a compound that generates an acid by being irradiated with active light ray and (c) a compound having a structure represented by a general formula (3) crosslinkable or polymerizable with said component (a).