Ibaraki, Japan

Tomoko Kawamura


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: The Innovations of Tomoko Kawamura

Introduction

Tomoko Kawamura is a prominent inventor based in Ibaraki, Japan. She has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. Her work has implications for various electronic components, showcasing her innovative spirit and technical expertise.

Latest Patents

Kawamura holds a patent for a positive photosensitive resin composition, which is notable for its ability to be developed in an alkaline aqueous solution. This composition is designed to produce well-shaped patterns that exhibit excellent heat resistance and mechanical properties. The patent details a method for forming patterns and outlines the composition's components, which include polybenzoxazole or its precursors, an acid-generating compound, and a crosslinkable or polymerizable compound.

Career Highlights

Throughout her career, Tomoko Kawamura has been associated with Hitachi Chemical Dupont Microsystems, L.L.C. Her work has not only advanced the field of electronic components but has also positioned her as a key figure in the innovation landscape of Japan.

Collaborations

Kawamura has collaborated with notable colleagues, including Tomonori Minegishi and Masayuki Ohe. These partnerships have further enriched her research and development efforts, leading to advancements in her field.

Conclusion

Tomoko Kawamura's contributions to the field of materials science and her innovative patents highlight her role as a leading inventor. Her work continues to influence the development of electronic components, showcasing the importance of innovation in technology.

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