Ibaraki, Japan

Taku Konno


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Hitachi, JP (2012)
  • Ibaraki, JP (2013 - 2015)

Company Filing History:


Years Active: 2012-2015

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3 patents (USPTO):Explore Patents

Title: The Innovative Mind of Taku Konno

Introduction

Taku Konno is an esteemed inventor based in Ibaraki, Japan, known for his contributions to the field of materials science, particularly in photosensitive resin compositions. With a total of three patents to his name, his work has significantly impacted the electronics industry.

Latest Patents

Among Taku Konno's latest patents are innovative developments that enhance the performance and functionality of electronic components. His notable patents include:

1. A positive photosensitive resin composition along with a method for producing a patterned cured film.

2. A positive photosensitive resin composition designed for circuit formation substrates, emphasizing the polymer's structural units and compounds that generate radicals upon irradiation with active rays.

Career Highlights

Taku Konno is currently associated with Hitachi Chemical DuPont Microsystems, L.L.C., where he applies his expertise in developing advanced materials for electronic applications. His career has been marked by a commitment to innovation and excellence in research and development.

Collaborations

In his professional journey, Taku Konno has collaborated with talented coworkers, including Tomonori Minegishi and Rika Nogita. These partnerships have fostered a creative environment that encourages the exchange of ideas and the advancement of technology.

Conclusion

Taku Konno's contributions to the realm of photosensitive resins underscore his role as a leading inventor in Japan. His patents not only demonstrate his innovative spirit but also pave the way for advancements in the electronics sector, illustrating the vital connection between invention and industry progress.

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