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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9751984 B1

PDFFull Text
Date of Patent:
Sep. 05, 2017

Filed:

Dec. 19, 2013

Polyimide precursor, photosensitive resin composition containing said polyimide precursor, and cured-pattern-film manufacturing method and semiconductor device using said photosensitive resin composition

Applicant:

Hitachi Chemical Dupont Microsystems, Ltd., Tokyo, JP;

Inventors:

Tetsuya Enomoto, Ibaraki, JP;

Keishi Ono, Ibaraki, JP;

Masayuki Ohe, Ibaraki, JP;

Keiko Suzuki, Ibaraki, JP;

Kazuya Soejima, Ibaraki, JP;

Etsuharu Suzuki, Ibaraki, JP;

Assignee:

HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD., Tokyo, JP;

Attorney:

Griffin and Szipl PC

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/037 (2006.01); G03F 7/031 (2006.01); C08G 73/10 (2006.01); C08G 73/16 (2006.01); C08K 5/33 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); C08F 290/14 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); C09D 179/08 (2006.01);
U.S. Cl.
CPC ...
C08G 73/1007 (2013.01); C08F 290/14 (2013.01); C08G 73/1039 (2013.01); C08G 73/1042 (2013.01); C08G 73/1053 (2013.01); C08G 73/1067 (2013.01); C08G 73/1071 (2013.01); C08G 73/16 (2013.01); C08K 5/33 (2013.01); C09D 179/08 (2013.01); G03F 7/031 (2013.01); G03F 7/037 (2013.01); G03F 7/0387 (2013.01); G03F 7/0388 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); G03F 7/40 (2013.01); H01L 21/02118 (2013.01); H01L 21/311 (2013.01);
Abstract

A polyimide precursor including a structural unit represented by the following general formula (1) in a ratio of 50 mol % or more based on the total structural units. In the general formula (1), A is a tetravalent organic group represented by the following general formula (2a), a tetravalent organic group represented by the following general formula (2b), or a tetravalent organic group represented by the following general formula (2c), and B is a divalent organic group represented by the following general formula (3).

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