The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Sep. 23, 2014
The Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, Sichuan, CN;
Xiangang Luo, Chengdu, CN;
Changtao Wang, Chengdu, CN;
Zeyu Zhao, Chengdu, CN;
Yanqin Wang, Chengdu, CN;
Mingbo Pu, Chengdu, CN;
Na Yao, Chengdu, CN;
Ping Gao, Chengdu, CN;
Chenggang Hu, Chengdu, CN;
Xiong Li, Chengdu, CN;
Cheng Huang, Chengdu, CN;
Leilei Yang, Chengdu, CN;
Liqin Liu, Chengdu, CN;
Jiong Wang, Chengdu, CN;
Jiayu He, Chengdu, CN;
Yunfei Luo, Chengdu, CN;
Kaipeng Liu, Chengdu, CN;
Chengwei Zhao, Chengdu, CN;
Ling Liu, Chengdu, CN;
Xiaoliang Ma, Chengdu, CN;
Min Wang, Chengdu, CN;
Abstract
Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.