Company Filing History:
Years Active: 2018
Title: **Chenggang Hu: Innovator in Super-Resolution Imaging Photolithography**
Introduction
Chenggang Hu is a distinguished inventor based in Chengdu, China, renowned for his contribution to the fields of photolithography and imaging technology. With one patent to his name, Hu has made significant strides in enhancing imaging resolution, a critical aspect within various scientific and industrial applications.
Latest Patents
Hu's sole patent titled "Super-resolution imaging photolithography" showcases his innovative approach to imaging technologies. The patent outlines apparatuses and methods designed to achieve super-resolution in imaging through photolithography. Notably, it includes an illumination light generation device that produces illumination light for projecting a pattern embedded in a mask.
The technology involves a high-frequency spatial spectrum, where the high-frequency evanescent wave component of spatial information is transformed into a low-frequency component after passing through the mask pattern. Furthermore, the illumination light generation device can be adjusted to operate in accordance with high numerical aperture (NA) illumination modes or surface plasmon (SP) wave illumination modes, highlighting Hu's ability to refine light manipulation techniques.
Career Highlights
Chenggang Hu is currently associated with the Chinese Academy of Sciences, where he engages in advanced research and development in imaging technologies. His role at this esteemed institution underscores his contributions to the scientific community and reflects his commitment to innovation.
Collaborations
Throughout his career, Hu has worked alongside notable colleagues, including Xiangang Luo and Changtao Wang. Their collaborative efforts contribute to a rich pool of knowledge and expertise in the field of photolithography, fostering innovation and advancing research outcomes.
Conclusion
Chenggang Hu stands out as a pivotal figure in the realm of super-resolution imaging photolithography. His innovative patent not only illustrates his technical expertise but also signifies the potential impact of his work on various applications in science and technology. Through continued research and collaboration, Hu is poised to inspire future advancements in imaging technologies.