Company Filing History:
Years Active: 2018
Title: The Innovative Mind of Jiong Wang: Pioneering Super-Resolution Imaging Photolithography
Introduction: Jiong Wang, an esteemed inventor located in Chengdu, China, has made significant contributions to the field of imaging technology. With a focus on enhancing photolithography techniques, he has been instrumental in advancing the capabilities of various imaging systems.
Latest Patents: Jiong Wang holds a patent for "Super-resolution imaging photolithography." This innovation provides apparatuses and methods designed to improve the resolution of imaging systems. The exemplary apparatus includes an illumination light generation device that produces illumination light to image patterns contained in a mask. Notably, the illumination light incorporates a high-frequency spatial spectrum. This feature allows for the conversion of high-frequency evanescent wave components into low-frequency components after passing through the mask pattern. Furthermore, the device can be configured to operate under high numerical aperture illumination modes and surface plasmon wave illumination modes, marking a significant advancement in photolithography technology.
Career Highlights: Jiong Wang’s professional journey has been characterized by groundbreaking research and innovation. He is currently affiliated with the Chinese Academy of Sciences, showcasing his commitment to advancing technological research and development. His impressive patent portfolio is a testament to his dedication to innovation in his field.
Collaborations: Throughout his career, Jiong Wang has collaborated with notable colleagues, including Xiangang Luo and Changtao Wang. These collaborations have further strengthened his contributions to the field, allowing for the exchange of ideas and expertise that can lead to groundbreaking advancements in technology.
Conclusion: Jiong Wang represents the forefront of innovation in the field of imaging technology. His patent on super-resolution imaging photolithography not only highlights his inventive capabilities but also reflects his dedication to enhancing the scientific community's tools and methodologies. Through his work at the Chinese Academy of Sciences and his collaborations with fellow innovators, Wang continues to push the boundaries of what is possible in photolithography and imaging systems.