Chengdu, China

Ling Liu


 

Average Co-Inventor Count = 20.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Ling Liu - Innovator in Super-Resolution Imaging Photolithography

Introduction

Ling Liu is a prominent inventor based in Chengdu, China. She has made significant contributions to the field of imaging technology, particularly through her innovative work in super-resolution imaging photolithography. Her expertise and dedication have led to the development of advanced methods and apparatuses that enhance imaging capabilities.

Latest Patents

Ling Liu holds a patent for her invention titled "Super-resolution imaging photolithography." This patent encompasses apparatuses and methods designed to improve the resolution of imaging patterns through photolithography. The exemplary apparatus includes an illumination light generation device that produces illumination light for imaging a pattern included in a mask. The illumination light features a high-frequency spatial spectrum, allowing for the conversion of high-frequency evanescent wave components into low-frequency components after transmission through the mask pattern. This innovative approach may utilize high numerical aperture (NA) illumination modes and surface plasmon (SP) wave illumination modes.

Career Highlights

Ling Liu is affiliated with the Chinese Academy of Sciences, where she has been instrumental in advancing research in her field. Her work has not only contributed to academic knowledge but has also paved the way for practical applications in various industries. With her patent, she has established herself as a leading figure in the realm of imaging technology.

Collaborations

Ling Liu has collaborated with notable colleagues, including Xiangang Luo and Changtao Wang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas, further enhancing the impact of their research.

Conclusion

Ling Liu's contributions to super-resolution imaging photolithography exemplify her commitment to innovation and excellence in her field. Her work continues to influence advancements in imaging technology, showcasing the importance of research and collaboration in driving progress.

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