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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9947583 B1

PDFFull Text
Date of Patent:
Apr. 17, 2018

Filed:

Feb. 13, 2017

Method of semiconductor integrated circuit fabrication

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Ching-Fu Yeh, Hsinchu, TW;

Chao-Hsien Peng, Zhubei, TW;

Hsien-Chang Wu, Taichung, TW;

Hsiang-Huan Lee, Jhudong Township, Hsinchu County, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsin-Chu, TW;

Attorney:

Haynes and Boone, LLP

Primary Examiner:

Tu-Tu Ho

Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01L 21/768 (2006.01); H01L 21/3213 (2006.01); H01L 21/027 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76892 (2013.01); H01L 21/0271 (2013.01); H01L 21/0273 (2013.01); H01L 21/02115 (2013.01); H01L 21/32139 (2013.01); H01L 21/76885 (2013.01);
Abstract

A method of fabricating a semiconductor integrated circuit (IC) is disclosed. The method includes providing a substrate and depositing a conductive layer on the substrate. A patterned hard mask and a catalyst layer are formed on the conductive layer. The method further includes growing a plurality of carbon nanotubes (CNTs) from the catalyst layer and etching the conductive layer by using the CNTs and the patterned hard mask as an etching mask to form metal features.

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Yeh, Ching-Fu. (2018). Method of semiconductor integrated circuit fabrication (U.S. Patent No. 9947583). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9947583

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